Conference paper
Impact of thin resist processes on post-etch LER
Arpan P. Mahorowala, Dario L. Goldfarb, et al.
Microlithography 2003
The relative rates of varying Nb/Nb-TBE monomer feed ratios were evaluated by using real-time monitoring via in-situ FTIR spectroscopy of alternating copolymerizations of MA with Nb and Nb-TBE. Pseudo first order kinetic plots constructed from the in-situ FTIR absorbance data indicated that the rate of reaction is a strong function of the Nb/Nb-TBE ratio and decreased with increasing Nb-TBE.
Arpan P. Mahorowala, Dario L. Goldfarb, et al.
Microlithography 2003
Roderick R. Kunz, Robert D. Allen
Microlithography 1994
Hiroshi Ito, Greg M. Wallraff, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Narayan Sundararajan, Shu Yang, et al.
Chemistry of Materials