Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
The capacity of future high-density magnetic recording systems is expected to be limited primarily by "jitter". For such systems, a new simple channel model is proposed. A factor graph representation as well as upper and lower bounds on the capacity of this channel model are given.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
W.F. Cody, H.M. Gladney, et al.
SPIE Medical Imaging 1994
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Satoshi Hada
IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences