Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A notion of "exit-automaton" is introduced to play a role analogous to "machine scheme" or "program scheme". Exit-automata and machines are equipped with algebraic structure leading to a simple characterization of their behaviors. © 1970 Springer-Verlag.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Israel Cidon, Leonidas Georgiadis, et al.
IEEE/ACM Transactions on Networking
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Chi-Leung Wong, Zehra Sura, et al.
I-SPAN 2002