S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
The interaction between thermally grown SiO2 surfaces and hexafluoroazomethane was studied by means of soft X-ray photoemission. No interactions were observed for dark exposures, however, large exposures with simultaneous UV irradiation produced a surface layer consisting largely of trifluoromethyl radicals, the primary photolysis products of hexafluoroazomethane. The evolution of the surface as a function of annealing temperature is also discussed. © 1988.
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Ming L. Yu
Physical Review B
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials