R. Ghez, J.S. Lew
Journal of Crystal Growth
The interaction between thermally grown SiO2 surfaces and hexafluoroazomethane was studied by means of soft X-ray photoemission. No interactions were observed for dark exposures, however, large exposures with simultaneous UV irradiation produced a surface layer consisting largely of trifluoromethyl radicals, the primary photolysis products of hexafluoroazomethane. The evolution of the surface as a function of annealing temperature is also discussed. © 1988.
R. Ghez, J.S. Lew
Journal of Crystal Growth
E. Burstein
Ferroelectrics
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
Michiel Sprik
Journal of Physics Condensed Matter