Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We present a new rational algorithm for solving Risch differential equations in towers oftranscendental elementary extensions. In contrast to a recent algorithm of Davenport we do not require a progressive reduction of the denominators involved, but use weak normality to obtain a formula for the denominator of a possible solution. Implementation timings show this approach to be faster than a Hermite-like reduction. © 1990, Academic Press Limited. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
George Markowsky
J. Math. Anal. Appl.