Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Ziv Bar-Yossef, T.S. Jayram, et al.
Journal of Computer and System Sciences
Charles Micchelli
Journal of Approximation Theory
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics