Optimization of real phase-mask performance
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Chain scission induced by two-photon exposure produces a permanent birefringence in polysilane polymer films, which can be used for the formation of birefringent optical elements. Spectroscopy of the effect for poly(di-n-hexylsilane) reveals an unexpected sharp resonance at 580 nm. A comparison of several polysilanes indicates the effect only occurs in polymers with symmetric or near symmetric sidegroups. Models to explain these observations are introduced and discussed. © 1990.
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
R.D. Miller, E.J. Ginsburg, et al.
Polymer Journal
D. Mecerreyes, E. Huang, et al.
High Performance Polymers
D.A.McL. Smith, S.A. Williams, et al.
Journal of Physical Chemistry