M.O. Aboelfotoh, H.M. Tawancy
Journal of Applied Physics
We report a first observation of the remarkably low electrical resistivity of copper germanide thin films formed at temperatures below 200°C. At these low temperatures, the ε-Cu3Ge phase with a monoclinic crystal structure is formed, with room-temperature resistivity which can be as low as 5.5 μΩ cm. The films are electrically stable up to at least 600°C, and, unlike pure copper, are also stable against oxygen and air exposure.
M.O. Aboelfotoh, H.M. Tawancy
Journal of Applied Physics
T. Kato, T. Shibauchi, et al.
Physical Review Letters
L. Krusin-Elbaum, T. Shibauchi
European Physical Journal B
L. Krusin-Elbaum, G.A. Sai-Halasz
Applied Physics Letters