L. Krusin-Elbaum, G.A. Sai-Halasz
Applied Physics Letters
We report a first observation of the remarkably low electrical resistivity of copper germanide thin films formed at temperatures below 200°C. At these low temperatures, the ε-Cu3Ge phase with a monoclinic crystal structure is formed, with room-temperature resistivity which can be as low as 5.5 μΩ cm. The films are electrically stable up to at least 600°C, and, unlike pure copper, are also stable against oxygen and air exposure.
L. Krusin-Elbaum, G.A. Sai-Halasz
Applied Physics Letters
L. Krusin-Elbaum, G. Blatter, et al.
Physical Review Letters
H.M. Tawancy, M.O. Aboelfotoh
physica status solidi (a)
M.O. Aboelfotoh, C. Feger, et al.
Applied Physics Letters