PaperPersistent spectral hole burning in deuterated (formula presented)R.M. Macfarlane, R.L. ConePhysical Review B - CMMP
PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
PaperRadical polymerization of N‐phenyl‐α‐methylene‐β‐lactamMitsuru Ueda, Hideharu Mori, et al.Journal of Polymer Science Part A: Polymer Chemistry
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