Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A famous theorem of Ryser asserts that a v × v zero-one matrix A satisfying AAT = (k - λ)I + λJ with k ≠ λ must satisfy k + (v - 1)λ = k2 and ATA = (k - λ)I + λJ; such a matrix A is called the incidence matrix of a symmetric block design. We present a new, elementary proof of Ryser's theorem and give a characterization of the incidence matrices of symmetric block designs that involves eigenvalues of AAT. © Elsevier Science Inc., 1997.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997