R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
The 300 K kinetics of dissociative chemisorption and oxide island nucleation and growth are compared for Ni(100) and Ni(111). We conclude that the behavior of oxygen sticking probability as a function of coverage can be understood in terms of direct Langmuir adsorption (no molecular diffusion) and the availability of active empty clusters of adsorption sites of certain sizes and configurations. © 1985, American Vacuum Society. All rights reserved.
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025
T.N. Morgan
Semiconductor Science and Technology
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting