Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Inteirconnecction of components in a VLSI chip is becoming an increasingly complex problem. In this paper we examine the complexity of the wire routing process and discuss several new approaches to solving the problem using a parallel system architecture. The ma-chines discussed range from compact systems for highly specialized applications to more general designs suited for broader applications. The process speedup due to parallelism and the cost advantage due to the use of large numbers of identical VLSI parts make these new machines practical today. Copyright © 1983 by The Institute of Electrical and Electronics Engineers, Inc.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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CLEF 2013
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INFOCOM 2008
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ITA Conference 2007