X-ray lithography and storage rings

Abstract

An evaluation of specification for storage rings designed for X-ray lithography has been done, based on our experience with X-ray lithography at the NSLS VUV ring at Brookhaven National Laboratory. The useful flux (from a lithography standpoint) available from a storage has been reduced to a universal curve of power as a function of critical wavelength. Similar universal curves have been generated for contrast and efficiency of use. The effect of emittance on lithographic fidelity has been analyzed for beamline optics similar to the optics we now use at the NSLS, and tolerances on emittance are given. © 1986.