WELL COUPLED dc SQUID WITH EXTREMELY LOW 1/F NOISE.
- C.D. Tesche
- K.H. Brown
- et al.
- 1983
- International Conference on Low Temperature Physics (LT) 1983
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14 results for M. Chen
Reactive etching mechanism of tungsten silicide in CF4-O2 plasma
- Young H. Lee
- Mao-Min Chen
- et al.
- 1984
- Thin Solid Films
Silicon etching mechanism and anisotropy in CF4+O2 plasma
- Young H. Lee
- Mao-Min Chen
- 1983
- Journal of Applied Physics
Plasma etching of niobium with CF4/O2 gases
- Mao-Min Chen
- Run Han Wang
- 1983
- JVSTA