Proximity effects and influences of nonuniform illumination in projection lithography
- P.D. Robertson
- F.W. Wise
- et al.
- 1989
- Proceedings of SPIE 1989
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7 results for Chiu H. Ting
Resist characterization: Procedures, parameters, and profiles
- M. Exterkamp
- W. Wong
- et al.
- 1989
- Proceedings of SPIE 1989
Single and dual wavelength exposure of photoresist
- J. LaRue
- C. Ting
- 1989
- Proceedings of SPIE 1989
Monte Carlo simulation of fast secondary electron production in electron beam resists
- Kenji Murata
- David F. Kyser
- et al.
- 1981
- Journal of Applied Physics
Resolution and Linewidth Tolerances in Electron Beam and Optical Projection Lithography
- Tung Symon Chang
- David F. Kyser
- et al.
- 1981
- IEEE T-ED
Application of Line-Edge Profile Simulation to Thin-Film Deposition Processes
- Andrew R. Neureuther
- Chiu H. Ting
- et al.
- 1980
- IEEE T-ED
Electron-Beam Resist Edge Profile Simulation
- David F. Kyser
- Chiu H. Ting
- 1979
- IEEE T-ED