Airborne Contamination of a Chemically Amplified Resist. 1. Identification of Problem
- Scott A. MacDonald
- William D. Hinsberg
- et al.
- 1993
- Chemistry of Materials
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58 results for Scott A. MacDonald
Overview of top-surface-imaging resists
- Scott A. MacDonald
- 1991
- ACS Spring 1991
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992
Acid generation and acid diffusion in photoresist films
- D.R. McKean
- R.D. Allen
- et al.
- 1992
- Microlithography 1992
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Vanishing interfacial tension in an immiscible polymer blend
- Kenneth R. Shull
- Andrew J. Kellock
- et al.
- 1992
- The Journal of Chemical Physics
Polymer effects on the photochemistry of triarylsulfonium salts
- D.R. McKean
- R.D. Allen
- et al.
- 1991
- SPIE San Diego 1991
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991