The importance of cage versus escape reactivity in the photochemistry of onium salts
- Nigel P. Hacker
- John L. Dektar
- et al.
- 1991
- J. Photopolym. Sci. Tech.
Publications
Date
Featured collections
Popular topics
58 results for Scott A. MacDonald
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- C.A. Spence
- S.A. Macdonald
- et al.
- 1990
- Microlithography 1990
1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
Characterization of a Photoresist with Wavelength Selected Tone
- Lester A. Pederson
- Andrew R. Neureuther
- et al.
- 1990
- IEEE T-ED
Silicon-rich surfaces in polymer resists
- R.D. Allen
- Scott A. MacDonald
- 1989
- International SAMPE Electronics Conference 1989
Investigations on the structural morphology of sulfonium salt containing polymethacrylate films
- R.D. Allen
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Acid photogeneration from sulfonium salts in solid polymer matrices
- D.R. McKean
- U. Schaedeli
- et al.
- 1988
- ACS PMSE 1988
Polymeric matrix effects on the efficiency of acid generation from triphenylsulfonium salts
- D.R. McKean
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Novolac based deep-uv resists
- Dennis R. McKean
- Scott A. Macdonald
- et al.
- 1989
- Proceedings of SPIE 1989