Epitaxy of ultrathin NiSi2 films with predetermined thicknessXindong GaoJoakim Anderssonet al.2011Electrochemical and Solid-State Letters
Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1-x Ptx silicide filmsZhen ZhangBin Yanget al.2010Applied Physics Letters
Interaction of NiSi with dopants for metallic source/drain applicationsJun LuoZhi-Jun Qiuet al.2010Journal of Vacuum Science and Technology B
Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1-x Ptx on Si substrateZhen ZhangShi Li Zhanget al.2010Applied Physics Letters