Atomic motion of dopant during interfacial silicide formation
- M. Wittmer
- C.-Y. Ting
- et al.
- 1983
- Thin Solid Films
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34 results for C.-Y. Ting
ZrN diffusion barrier in aluminum metallization schemes
- L. Krusin-Elbaum
- M. Wittmer
- et al.
- 1983
- Thin Solid Films
Redistribution of As during Pd2Si formation: Ion channeling measurements
- M. Wittmer
- C.-Y. Ting
- et al.
- 1982
- Journal of Applied Physics
The use of titanium-based contact barrier layers in silicon technology
- C.-Y. Ting
- M. Wittmer
- 1982
- Thin Solid Films