Rational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
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127 results for Hiroshi Ito
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- Hiroshi Ito
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Fluoropolymer platforms for 157 nm resist applications
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- International Conference on Microprocesses and Nanotechnology 2001
Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
Real-time analysis of volatiles formed during processing of a chemically amplified resist
- F.A. Houle
- G.M. Poliskie
- et al.
- 2000
- Microlithography 2000
Chemically amplified resists: Past, present, and future
- Hiroshi Ito
- 1999
- SPIE Advances in Resist Technology and Processing 1999
NMR analysis of chemically amplified resist films
- Hiroshi Ito
- M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- M.I. Sanchez
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Influence of acid generator structure on T-top formation in high-temperature bake processes for environmental stabilization
- Hiroshi Ito
- G. Breyta
- et al.
- 1995
- Microlithography 1995