Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
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127 results for Hiroshi Ito
ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
Developing chemical amplification resists for semiconductor device fabrication by microlithography
- Hiroshi Ito
- 2005
- SPSJ Annual Meeting 2005
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Direct measurement of the counterion distribution within swollen polyelectrolyte films
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Langmuir
Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2005
- Macromolecules