APPLICATIONS OF PHOTOINITIATORS TO THE DESIGN OF RESISTS FOR SEMICONDUCTOR MANUFACTURING.
- Hiroshi Ito
- Grant Willson
- 1983
- ACS National Meeting 1983
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127 results for Hiroshi Ito
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Development of new advanced resist materials for microlithography
- Hiroshi Ito
- 2008
- J. Photopolym. Sci. Tech.
Chemical amplification resists: Laboratory curiosity to paradigm
- Hiroshi Ito
- 2007
- J. Photopolym. Sci. Tech.
Bilayer resists for 193 nm lithography: SSQ and POSS
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoropolymer resists: Fundamentals and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2004
- J. Photopolym. Sci. Tech.
Fluoropolymer resists: Progress and properties
- Hiroshi Ito
- H.D. Truong
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.