Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
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127 results for Hiroshi Ito
Real-time analysis of volatiles formed during processing of a chemically amplified resist
- F.A. Houle
- G.M. Poliskie
- et al.
- 2000
- Microlithography 2000
Chemical amplification resists: History and development within IBM
- Hiroshi ItO
- 2000
- IBM J. Res. Dev
Fundamental aspects of norbornene-maleic anhydride co- and terpolymers for 193 nm lithography: Polymerization chemistry and polymer properties
- Hiroshi Ito
- Dolores C. Miller
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials
- Robert D. Allen
- Carl E. Larson
- et al.
- 2000
- J. Photopolym. Sci. Tech.
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
NMR analysis of chemically amplified resist films
- Hiroshi Ito
- M.H. Sherwood
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Chemically amplified resists: Past, present, and future
- Hiroshi Ito
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Aerial image contrast using interferometric lithography: Effect on line-edge roughness
- M.I. Sanchez
- W.D. Hinsberg
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Polymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
- et al.
- 1999
- ACS Spring 1999