SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
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3 results for T. Tompkins
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Determination of the structural configuration of cresol–novolak resins by 13C NMR spectroscopy
- J.A. Carothers
- E. Gipstein
- et al.
- 2003
- Journal of Applied Polymer Science