Fabrication and characterization of compact 100nm scale metal oxide semiconductor field effect transistors
- C. Reeves
- S.J. Wind
- et al.
- 1993
- Microelectronic Engineering
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20 results for F.J. Hohn
Electron beam lithography-tools and applications
- F.J. Hohn
- 1991
- Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Lithographic performance of an EL-3 system at 0.25μm groundrules
- T. Newman
- M.G.R. Thomson
- et al.
- 1991
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
Emission distribution, brightness, and mechanical stability of the LaB 6 triode electron gun
- Mark Gesley
- Fritz Hohn
- 1988
- Journal of Applied Physics
Electron beam / optical mixed lithography at half-micron ground rules
- P. Coane
- P. Rudeck
- et al.
- 1986
- Microelectronic Engineering
Background and applications of electron beam test techniques
- Fritz J. Hohn
- 1986
- Microelectronic Engineering
Background and applications of electron beam test techniques
- Fritz J. Hohn
- 1985
- Microelectronic Engineering
Fabrication and testing of single-crystal lanthanum hexaboride rod cathodes
- F.J. Hohn
- T.H.P. Chang
- et al.
- 1982
- Journal of Applied Physics