Emission distribution, brightness, and mechanical stability of the LaB 6 triode electron gun
- Mark Gesley
- Fritz Hohn
- 1988
- Journal of Applied Physics
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20 results for F.J. Hohn
Fully scaled 0.5 micron CMOS technology using variable shaped electron beam lithography
- Philip Coane
- Paul Rudeck
- et al.
- 1989
- Proceedings of SPIE 1989
Contrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- W. Molzen
- Michael G. Rosenfield
- et al.
- 1989
- Proceedings of SPIE 1989
Review of e-beam electrical test techniques
- Fritz J. Hohn
- 1989
- Proceedings of SPIE 1989
0. 5 MICRON GATE CMOS TECHNOLOGY USING E-BEAM/OPTICAL MIX LITHOGRAPHY.
- L.K. Wang
- Y. Taur
- et al.
- 1985
- VLSI Technology 1985
Electron beam / optical mixed lithography at half-micron ground rules
- P. Coane
- P. Rudeck
- et al.
- 1986
- Microelectronic Engineering
Background and applications of electron beam test techniques
- Fritz J. Hohn
- 1986
- Microelectronic Engineering
Background and applications of electron beam test techniques
- Fritz J. Hohn
- 1985
- Microelectronic Engineering
Fabrication and testing of single-crystal lanthanum hexaboride rod cathodes
- F.J. Hohn
- T.H.P. Chang
- et al.
- 1982
- Journal of Applied Physics
Electron beam testing and its application to packaging modules for very large scale integrated (vlsi) chip arrays
- F.J. Hohn
- T.H.P. Chang
- et al.
- 1989
- Proceedings of SPIE 1989