DIFFUSION OF ION-IMPLANTED BORON AND PHOSPHORUS DURING RAPID THERMAL ANNEALING OF SILICON.
- G.S. Oehrlein
- R. Ghez
- et al.
- 1984
- ICDS 1984
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3 results for J.D. Fehribach
The Analysis of Diffusion Data by a Method of Moments
- R. Ghez
- J.D. Fehribach
- et al.
- 2019
- JES
Asymptotic estimates of diffusion times for rapid thermal annealing
- J.D. Fehribach
- R. Ghez
- et al.
- 1985
- Applied Physics Letters