Particle trapping phenomena in radio frequency plasmas
- Gary S. Selwyn
- John E. Heidenreich
- et al.
- 1990
- Applied Physics Letters
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17 results for J. Heidenreich
Plasma characterization of an electron cyclotron resonance-radio-frequency hybrid plasma reactor
- Young H. Lee
- John E. Heidenreich
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Influence of the applied field frequency (27-2450 MHz) in high-frequency sustained plasmas used to etch polyimide
- G. Sauvé
- M. Moisan
- et al.
- 1988
- Applied Physics Letters
X-ray photoelectron and infrared spectroscopy of microwave plasma etched polyimide surfaces
- N.J. Chou
- J. Paraszczak
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The use of organosilicon polymers in multilayer plasma resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1987
- Microelectronic Engineering
Ion energy and anisotropy in microwave plasma etching of polymers
- J. Heidenreich
- J. Paraszczak
- et al.
- 1986
- Microelectronic Engineering
Methods of creation and effect of microwave plasmas upon the etching of polymers and silicon
- J. Paraszczak
- J. Heidenreich
- et al.
- 1985
- Microelectronic Engineering