Removal of Fluorocarbon Residues on CF4/H2 Reactive-ion-Etched Silicon Surfaces Using a Hydrogen Plasma
- J. Simko
- G.S. Oehrlein
- et al.
- 2019
- JES
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2 results for T.M. Mayer
Reactive sputtering of copper and silicon near the sputtering threshold
- T.M. Mayer
- J.M.E. Harper
- et al.
- 1985
- JVSTA