Stability of electrical properties of nitrogen-rich, silicon-rich, and stoichiometric silicon nitride films
- W.S. Lau
- S.J. Fonash
- et al.
- 1989
- Journal of Applied Physics
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A study of CClF3/H2 reactive ion etching damage and contamination effects in silicon
- X.C. Mu
- S.J. Fonash
- et al.
- 1986
- Journal of Applied Physics