Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- G. Sauvé
- M. Moisan
- et al.
- 1989
- Microelectronic Engineering
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Influence of the applied field frequency (27-2450 MHz) in high-frequency sustained plasmas used to etch polyimide
- G. Sauvé
- M. Moisan
- et al.
- 1988
- Applied Physics Letters
Ion energy and anisotropy in microwave plasma etching of polymers
- J. Heidenreich
- J. Paraszczak
- et al.
- 1986
- Microelectronic Engineering