Etching of silicon and silicon dioxide by halofluorocarbon plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 2000
- Journal of Physics D: Applied Physics
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On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 1989
- Plasma Chemistry and Plasma Processing