Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 1988
- SPE Regional Technical Conference 1988
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7 results for S. Matuszczak
Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Chemically amplified resists based on polymer side‐chain rearrangement or electrophilic crosslinking
- J.M.J. Fréchet
- S. Matuszczak
- et al.
- 2004
- Polymer Engineering & Science
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 2004
- Polymer Engineering & Science
Chemically Amplified Imaging Materials Based on Electrophilic Aromatic Substitution: Poly[4-(acetoxymethyl)styrene-co-4-hydroxystyrene]
- Jean M.J. Frécnet
- Stephen Matuszczak
- et al.
- 2002
- Macromolecules
Design of Polymeric Imaging Materials Based on Electrophilic Aromatic Substitution: Model Studies
- Harald D.H. Stöver
- Stephen Matuszczak
- et al.
- 2002
- Macromolecules
Photogenerated amines and their use in the design of a positive-tone resist material based on electrophilic aromatic substitution
- Stephen Matuszczak
- James F. Cameron
- et al.
- 1991
- Journal of Materials Chemistry