Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
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4 results for Hubert Schlosser
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- C.A. Spence
- S.A. Macdonald
- et al.
- 1990
- Microlithography 1990
Plasma-Developable Photoresist Systems Based on Chemical Amplification
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 2002
- Chemistry of Materials
A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal
- Scott A. MacDonald
- Nicholas J. Clecak
- et al.
- 2002
- Chemistry of Materials