Publications

4 results for Hubert Schlosser

Plasma-Developable Photoresist Systems Based on Chemical Amplification
- - Scott A. MacDonald
  - Hiroshi Ito
  - et al.
- 2002
- Chemistry of Materials
A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal
- - Scott A. MacDonald
  - Nicholas J. Clecak
  - et al.
- 2002
- Chemistry of Materials
Top-surface-imaging resist for deep UV lithography
- - Scott A. MacDonald
  - H. Schlosser
  - et al.
- 1991
- International Technical Conference on Photopolymers 1991
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- - C.A. Spence
  - S.A. Macdonald
  - et al.
- 1990
- Microlithography 1990