The influence of silicon substrate crystallinity and doping on TiSi2 thin film morphologyT.E. KarlinS. Nygrenet al.1993Applied Surface Science
Electrical evaluation of high-temperature effects on gate oxide integrity in a self-aligned CoSi2 MOS processT.E. KarlinS.-L. Zhanget al.1993Applied Surface Science
Morphological instabilities of nickel and cobalt silicides on siliconS. NygrenD. Caffinet al.1991Applied Surface Science