IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
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17 results for D. Fenzel‐Alexander
Silicon-containing resists for 157 nm applications
- Ratnam Sooriyakumaran
- Debra Fenzel-Alexander
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Ellipsometric measurement of solid fluorocarbon film thickness on magnetic recording media
- Tom Karis
- George W. Tyndall
- et al.
- 1997
- Journal of Applied Physics
Characterization of a solid fluorocarbon film on magnetic recording media
- Tom Karis
- George W. Tyndall
- et al.
- 1997
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Control of Contact Charge in Polymers with Ionomers
- D. Fenzel-Alexander
- P.J. Brock
- et al.
- 1994
- Langmuir
An Ion Transfer Model for Contact Charging
- A. Diaz
- D. Fenzel-Alexander
- 1993
- Langmuir
Ionomers as charge additives
- A. Diaz
- D. Fenzel-Alexander
- et al.
- 1990
- Journal of polymer science. Part C, Polymer letters