Fabrication of Tungsten Local Interconnect for VLSI Bipolar Technology
- N.J. Mazzeo
- J.D. Warnock
- et al.
- 1993
- JES
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3 results for E. Kobeda
A high performance epitaxial SiGe-base ECL BiCMOS technology
- D.L. Harame
- E.F. Crabbe
- et al.
- 1992
- IEDM 1992
Diffusion barrier properties of TiN films for submicron silicon bipolar technologies
- E. Kobeda
- J. Warnock
- et al.
- 1992
- Journal of Applied Physics