Electron-sheath interaction in capacitive radio-frequency plasmas
- D. Vender
- R.W. Boswell
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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7 results for David Vender
Collisionless electron heating by radio-frequency plasma sheaths
- M. Surendra
- D. Vender
- 1994
- Applied Physics Letters
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
- G.S. Oehrlein
- Y. Zhang
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Selective reactive ion etching of phosphorus-doped oxide over undoped SiO2
- David Vender
- Gottlieb S. Oehrlein
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Ion-induced fluorination in electron cyclotron resonance etching of silicon studied by x-ray photoelectron spectroscopy
- David Vender
- Marco Haverlag
- et al.
- 1992
- Applied Physics Letters
Ellipsometric study of silicon surface damage in electron cyclotron resonance plasma etching using CF4 and SF6
- M. Haverlag
- D. Vender
- et al.
- 1992
- Applied Physics Letters