Inspection and repair of EUV
- Emily Fisch
- Louis Kindt
- et al.
- 2001
- SPIE Photomask 2001
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4 results for M.J. Lercel
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Etching processes and characteristics for the fabrication of refractory x-ray masks
- Michael J. Lercel
- Cameron J. Brooks
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Chemical and electrical properties of interfaces between deposited insulators and La2CuO4
- A. Levy
- M.J. Lercel
- et al.
- 1992
- Journal of Applied Physics