SiGe pMOSFET's with Gate Oxide Fabricated by Microwave Electron Cyclotron Resonance Plasma Processing
- P.W. Li
- E.S. Yang
- et al.
- 1994
- IEEE Electron Device Letters
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Formation of stoichiometric SiGe oxide by electron cyclotron resonance plasma
- P.W. Li
- H.K. Liou
- et al.
- 1992
- Applied Physics Letters