Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

Date

Start

End

Featured collections

Popular topics

24 results for R. Jammy

HfO ₂/metal stacks: Determination of energy level diagram, work functions & their dependence on metal deposition
- - S. Zafar
  - V. Narayanan
  - et al.
- 2005
- VLSI Technology 2005
High performance FDSOI CMOS technology with metal gate and high-k
- - Bruce Doris
  - Y.-H. Kim
  - et al.
- 2005
- VLSI Technology 2005
Role of oxygen vacancies in V_FB/V_t stability of pFET metals on HfO₂
- - E. Cartier
  - F.R. McFeely
  - et al.
- 2005
- VLSI Technology 2005
Optimization of high κ gate stacks with poly-Si, FUSI and metal electrodes
- - R. Jammy
  - V. Narayanan
  - et al.
- 2005
- ISTC 2005
Electron mobility dependence of W/HFO ₂ gate stacks on interfacial layer preparation
- - A.C. Callegari
  - P. Jamison
  - et al.
- 2005
- ECS Meeting 2005
Poly-Si/high-k gate stacks with near-ideal threshold voltage and mobility
- - M.M. Frank
  - V.K. Paruchuri
  - et al.
- 2005
- VLSI-TSA 2005
Ultra-thin SOI replacement gate CMOS with ALD TaN / high-k gate stack
- - B. Doris
  - B.P. Linder
  - et al.
- 2005
- VLSI-TSA 2005
A comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO ₂)
- - S. Zafar
  - M. Yang
  - et al.
- 2005
- VLSI Technology 2005
Thermally robust dual-work function ALD-MN _x MOSFETs using conventional CMOS process flow
- - D.-G. Park
  - Z. Luo
  - et al.
- 2004
- VLSI Technology 2004
Systematic study of pFET V_t with Hf-based gate stacks with poly-Si and FUSI gates
- - E. Cartier
  - V. Narayanan
  - et al.
- 2004
- VLSI Technology 2004