Directed self-assembly on sparse chemical patterns for lithographic applications
- Joy Y. Cheng
- Alshakim Nelson
- et al.
- 2009
- J. Photopolym. Sci. Tech.
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Facile postpolymerization end-modification of RAFT polymers
- Jason M. Spruell
- Benjamin A. Levy
- et al.
- 2008
- J Polym Sci Part A