Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
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3 results for David A. Smith
193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
Surface-imaged silicon polymers for 193-nm excimer laser lithography
- Patricia A. Bianconi
- David A. Smith
- et al.
- 1992
- Japanese Journal of Applied Physics