Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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6 results for David Brown

A 300-mm wafer-level three-dimensional integration scheme using tungsten through-silicon via and hybrid cu-adhesive bonding
- - F. Liu
  - R.R. Yu
  - et al.
- 2008
- IEDM 2008
High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- - S. Narasimha
  - K. Onishi
  - et al.
- 2006
- IEDM 2006
Advanced metallization developments for 32-nm node CMOS technology contact architecture
- - Doug H. Lee
  - Valli Arunachalam
  - et al.
- 2009
- ADMETA 2009
High performance 32nm SOI CMOS with high-k/metal gate and 0.149μm ² SRAM and ultra low-k back end with eleven levels of copper
- - B. Greene
  - Q. Liang
  - et al.
- 2009
- VLSI Technology 2009
Implementation of robust nickel alloy salicide process for high-performance 65nm SOI CMOS manufacturing
- - Jay Strane
  - David Brown
  - et al.
- 2007
- VLSI-TSA 2007
Dual stress liner enhancement in hybrid orientation technology
- - C. Sheraw
  - M. Yang
  - et al.
- 2005
- VLSI Technology 2005