Using pattern shift to avoid blank defects during EUVL mask fabrication
- Yoshiyuki Negishi
- Yuki Fujita
- et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.