Reactive diffusion in the Ni-Si system: Phase sequence and formation of metal-rich phases
- C. Lavoie
- C. Coia
- et al.
- 2004
- DIMAT 2004
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6 results for C. Detavernier
Towards implementation of a nickel silicide process for CMOS technologies
- C. Lavoie
- F.M. D'Heurle
- et al.
- 2003
- Microelectronic Engineering
Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2009
- Applied Physics Letters
Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots
- D. Smeets
- J. Demeulemeester
- et al.
- 2008
- Journal of Applied Physics
Formation and stability of NiSi in the presence of Co and Fe alloying elements
- D. Deduytsche
- C. Detavernier
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Nucleation and diffusion during growth of ternary Co1-x Nix Si2 thin films studied by complementary techniques in real time
- D. Smeets
- J. Demeulemeester
- et al.
- 2008
- Journal of Applied Physics