Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing
- H.S. Yang
- R. Malik
- et al.
- 2004
- IEDM 2004
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4 results for A. Mallikarjunan
Low-k spacers for advanced low power CMOS devices with reduced parasitic capacitances
- Elbert Huang
- Eric Joseph
- et al.
- 2008
- IEEE International SOI Conference 2008
Supercritical CO2 extraction of porogen phase: An alternative route to nanoporous dielectrics
- J.A. Lubguban
- S. Gangopadhyay
- et al.
- 2004
- Journal of Materials Research
Supercritical carbon dioxide extraction of porogens for the preparation of ultralow-dielectric-constant films
- T. Rajagopalan
- B. Lahlouh
- et al.
- 2003
- Applied Physics Letters