A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process
- X. Chen
- S. Samavedam
- et al.
- 2008
- VLSI Technology 2008
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RF characterization and parameter extraction for CMOS device models
- John J. Pekarik
- Basanth Jagannathan
- et al.
- 2007
- SiRF 2007