Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers
- Joy K. Cheng
- Charles T. Rettner
- et al.
- 2008
- Advanced Materials
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.