22 nm technology compatible fully functional 0.1 μm 2 6T-sram cell
- B. Haran
- A. Kumar
- et al.
- 2008
- IEDM 2008
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Characterization of iodoheptafluoropropane as a dielectric etchant. I. Process performance evaluation
- Simon Karecki
- Ritwik Chatterjee
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures