Publications

2 results for G. Hefferon

Reduction of RTA-driven intra-die variation via model-based layout optimization
- - J.C. Scott
  - O. Gluschenkov
  - et al.
- 2009
- VLSI Technology 2009
Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- - Willard Conley
  - Ravindra Akkapeddi
  - et al.
- 1994
- Microlithography 1994