ALD TaN barrier for enhanced performance with low contact resistance for 14 nm Technology Node Cu Interconnects
- Joyeeta Nag
- Brian A. Cohen
- et al.
- 2015
- ECS Meeting 2015 Phoenix
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Interconnects exhibiting enhanced electromigration short-length effects by line width variation
- Ronald Filippi
- P.-C. Wang
- et al.
- 2014
- IRPS 2014